264, Naehyangan-gil, Jeongnam-myeon, Hwaseong-si, Gyeonggi-do, Republic of Korea
Wafer Sensor KIT for Chamber A, B of Product
Wafer Sensor KIT for Chamber A, B of Product
‧ Advantage
- The three Wafer Detect Sensors emit a beam at three locations above the cool down pedestal, forming a triangular beam area just above the wafer.
By default, CH#B can prevent wafer damage when the wafer position is abnormal.
(Sticking issue is very easy, especially during the ALCU Process process.)
AMAT 200mm Endura & Centura PVD is the main product, leading the industry’s used equipment based on differentiated technology and know-how, and supplying the best products.
Wafer Sensor KIT for Chamber A, B
The wafer sensor kit for chamber A and B is a device used to detect the offset of a wafer in semiconductor manufacturing processes. Wafer offset is a phenomenon that can occur when a wafer is placed on a pedestal in a machine, and it can cause damage or defects to the wafer.
The wafer sensor kit for chamber A and B uses three sensors to detect the offset of the wafer. Each sensor emits a beam onto three different positions on the outside pedestal, forming a triangular beam area on the wafer. If the wafer is offset, the beam area will be distorted, and the sensor will detect this.
Wafer Sensor KIT for Chamber A, B Classification
Semiconductor manufacturing equipment : Semiconductor manufacturing equipment is a broad category of equipment used to manufacture semiconductor devices, such as integrated circuits (ICs). Wafer sensor kit for chamber A and B is a type of semiconductor manufacturing equipment that is used to detect the offset of a wafer.
Wafer inspection equipment : Wafer inspection equipment is used to inspect wafers for defects. Wafer sensor kit for chamber A and B is a type of wafer inspection equipment that is used to detect the offset of a wafer.
Wafer Sensor KIT for Chamber A, B Component
Sensors: Sensors measure the offset of the wafer. The wafer sensor kit for chamber A and B uses a total of three sensors. Each sensor emits a beam onto three different positions on the outside pedestal of the wafer, forming a triangular beam area on the wafer. If the wafer is offset, the beam area will be distorted. The sensor detects the distortion of the beam area and calculates the offset of the wafer.(High sensitivity, Wide operating range, Fast response speed)
Beam generators : Beam generators emit beams to the sensors. The wafer sensor kit for chamber A and B typically uses lasers to generate beams.(High output, Uniform beam shape)
Control units : Control units control sensors and beam generators. They also calculate and output the offset of the wafer.(High processing speed, Accurate calculation)
Wafer Sensor KIT for Chamber A, B Features Function
Detects wafer offset quickly and accurately : Wafer offset can cause damage or defects to the wafer. The wafer sensor kit for chamber A and B uses three sensors to detect the wafer offset quickly and accurately. Each sensor measures the wafer offset from a different angle, allowing for more accurate calculation of the wafer offset.
Uses three sensors for more accurate measurement : Using three sensors to measure the wafer offset provides more accurate results. Each sensor measures the wafer offset from a different angle, allowing for more accurate calculation of the wafer offset.
Adjustable sensitivity for use with a variety of wafer sizes and types : The wafer sensor kit for chamber A and B has adjustable sensitivity, allowing for use with a variety of wafer sizes and types. The sensitivity should be lowered for larger or thinner wafers for accurate measurement. The sensitivity can also be adjusted based on the type of wafer.
Uses advanced technology : The wafer sensor kit for chamber A and B uses advanced technology. The beam-based wafer offset detection technology is faster and more accurate than traditional methods.
High performance : The wafer sensor kit for chamber A and B is a high-performance device. It can detect the wafer offset quickly and accurately using three sensors, and the sensitivity can be adjusted to accommodate a variety of wafer sizes and types.
Easy to maintain : The wafer sensor kit for chamber A and B is easy to maintain. The main components, such as the sensors and beam generators, can be easily replaced.
Maintenance and Management Services
264, Naehyangan-gil, Jeongnam-myeon, Hwaseong-si, Gyeonggi-do, Republic of Korea (18523)