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Centura PVD of Product

Advanced Semiconductor Korea - 주식회사 에이에스케이 - semiask - ASK Co., Ltd. - ASK Corporation - Endura - Centura PVD - TxZ Gas cabinet - Wafer Sensor KIT for Chamber A, B - Wafer Orienter KIT for SIC/Glass/Sapphire - https://semiask.com
Advanced Semiconductor Korea - 주식회사 에이에스케이 - semiask - ASK Co., Ltd. - ASK Corporation - Endura - Centura PVD - TxZ Gas cabinet - Wafer Sensor KIT for Chamber A, B - Wafer Orienter KIT for SIC/Glass/Sapphire - https://semiask.com
Advanced Semiconductor Korea - 주식회사 에이에스케이 - semiask - ASK Co., Ltd. - ASK Corporation - Endura - Centura PVD - TxZ Gas cabinet - Wafer Sensor KIT for Chamber A, B - Wafer Orienter KIT for SIC/Glass/Sapphire - https://semiask.com

AMAT 200mm Endura & Centura PVD is the main product, leading the industry’s used equipment based on differentiated technology and know-how, and supplying the best products.

Advanced Semiconductor Korea - 주식회사 에이에스케이 - semiask - ASK Co., Ltd. - ASK Corporation - Endura - Centura PVD - TxZ Gas cabinet - Wafer Sensor KIT for Chamber A, B - Wafer Orienter KIT for SIC/Glass/Sapphire - https://semiask.com
Advanced Semiconductor Korea - 주식회사 에이에스케이 - semiask - ASK Co., Ltd. - ASK Corporation - Endura - Centura PVD - TxZ Gas cabinet - Wafer Sensor KIT for Chamber A, B - Wafer Orienter KIT for SIC/Glass/Sapphire - https://semiask.com

Centura PVD

Centura PVD equipment is a type of chemical vapor deposition (CVD) equipment used in the manufacturing of semiconductor devices. CVD is a process that uses high-temperature gases to deposit a desired thin film. Centura PVD equipment supports a variety of CVD processes, including electron-beam deposition (EB-PVD), plasma deposition (PVD), and thermal deposition (CVD).

Centura PVD Classification

Source material type : Classified by the element to be deposited. Includes metals, oxides, and compounds.

Deposition process : Classified by the deposition process. Includes electron-beam deposition, plasma deposition, and thermal deposition.

Chamber size : Classified by the size of the film to be deposited. Includes small, medium, and large.

Production volume : Classified by the amount of film produced. Includes low, medium, and high.

Centura PVD Component

Chamber : The space where the film is deposited. The chamber must be maintained in a vacuum state and be able to control temperature, pressure, and gas composition.

Source material : Supplies the element to be deposited. Can be supplied using an electron beam, plasma, or heat.

Heater : Heats the chamber to perform the deposition process. The chamber can be heated using a variety of methods, including a heating coil, induction, or microwaves.

Control system : Controls the process. Controls temperature, pressure, and gas composition.

Centura PVD Main functions

Deposition of films : Deposits the desired element to form a film.

Control of film quality : Controls the thickness, density, and composition of the film to form the desired quality of film.

Optimization of the manufacturing process of films : Optimizes the deposition process conditions to efficiently manufacture the desired film.

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